Researchers utilize photolithographic fabrication to make full-color QD-EL devices using QD-CC
Researchers from the Beijing Institute of Technology together with colleagues from the Beihang University have developed a new method to fabricate color-converted QL-ED panels using photolithographic fabrication.
The panels are based on emissive QDs, at a resolution of up to 6350 PPI (the researchers fabricated a range of panels, using pixel sizes ranging from 20 x 20 micron down to 2x2 micron). The patterned blue devices achieve a peak EQE of 7.8% and a maximum brightness of almost 40,000 nits. The patterned red devices achieve a peak EQE of 18% and a maximum brightness of just over 100,000 nits.
